This instrument is designed for the analysis and imaging of surfaces under UHV conditions. Since the system was commissioned in 1999, atomic resolution has been obtained on a routine basis and several major projects are underway.

The features of the system are:

AFM & STM modes

Preparation chamber with ion sputtering

In-situ ion bombardment

In-situ sample cleavage provision for analysis of fresh surfaces

Auxiliary STM for preliminary analysis under ambient or vacuum